In label and narrow-web manufacturing, effective contamination control is essential for maintaining quality and high productivity.
In processes using sensitive substrates such as films, foils, and label materials, even very small particles can cause printing defects, inclusions, and surface damage such as dents. These issues often become visible in downstream processes such as coating, laminating, or rewinding, leading to waste and customer complaints.
Practical limitations in dynamic narrow web environments
In narrow web production, frequent substrate changes, short production runs, materials with varying particle generation, and fluctuating static behavior make it challenging to maintain consistent cleaning performance using contact cleaning alone. Typical challenges include:
- Increased consumption of cleaning tapes or rolls
- Downtime for cleaning or replacing consumables
- Reduced effectiveness when contamination accumulates upstream of the contact cleaner
- High operator workload to maintain stable cleaning results
For this reason, many label and narrow-web producers focus on removing loose particles and dust in early production stages, before they contaminate the production environment and adhere to the substrate.
Non-contact cleaning designed for labels and narrow web applications
Based on the specific requirements of label and narrow-web production and in close collaboration with a specialist in cleaning technology for this sector, Weducon developed the HEM-70 Label/Narrow-web Cleaning System.
Weducon’s HEM-70 is a compact, non-contact cleaning system designed specifically for narrow web and label applications. It delivers the same proven non-contact cleaning performance as the established Weducon HE-series, used in the packaging and printing industry, while being adapted to narrow web widths and production dynamics.
Engineered for demanding environments
The HEM-70 is built on Weducon proven High Efficiency technology and designed for reliability, durability and consistent performance in highly dynamic narrow web production conditions.
By removing loose contamination before contact cleaning, or by operating independently where contact cleaning is not feasible, the HEM-70 helps stabilize cleaning performance, reduce consumable use, and improve overall process reliability.
What this means in practice
In demanding production environments, the HEM-70 helps achieve consistent results and lower operating costs. Key benefits include:
- Fewer inclusions during laminating and coating
- Improved print quality through early particle removal
- Reduced consumption of contact cleaning consumables
- Less downtime for maintenance and cleaning
- Higher productivity and improved yield
Typical applications of non-contact narrow web cleaning
- As a non-contact pre-cleaner upstream of contact cleaning systems
- For fibrous or delicate substrates where contact cleaning is not possible
- In processes where contact cleaning leads to excessive consumable usage
Technical considerations in label & narrow web contamination control
6. Label & narrow-web contamination control
The system can be mounted using base or cantilever brackets and utilizes existing mounting locations. Electrical integration requires PLC integration and frequency-controlled fan operation. Installation is straightforward using standard industrial connectors.
No. The system uses long-life filter cartridges with sub-micron filtration and antistatic coating. No disposable HEPA cassettes are required, and the filter medium has a life expectancy of at least 60 months under normal operating conditions.
When ionization is placed in front of the cleaner, loose particles are released before the extraction system can capture them. This creates the risk of particles ending up in the air or on the floor.
With ionization in the center of the cleaner, the released particles are immediately removed. That’s why the HEM-70 integrates 24V DC active ionization in the center of the cleaner, within the blower air channel. Clean airflow carries ions directly toward the substrate, improving static neutralization, preventing residual contamination, and reducing ionizer maintenance.
The HEM-70 typically operates with up to 30% lower energy consumption than conventional non-contact cleaning systems. Its optimized airflow design and efficient AFC filter/fan unit provide stable cleaning performance with reduced operational load.
Yes. The system operates at up to 25% lower noise levels compared to conventional systems, contributing to a cleaner and more comfortable working environment in narrow web production facilities.
The COL270B-AL filter cartridges are ATEX certified and grounded throughout. The antistatic aluminium coating ensures high electrical conductivity (Rd < 10³ Ohm), effectively dissipating electrostatic charges and enhancing safety in explosion-sensitive production environments. The pneumatic cleaning valves are ATEX certified, and when a placement in an ATEX zone is needed, the motor specifications can be adapted. Only the control cabinet must be placed outside the zone.
The AFC filter/fan unit uses reverse-jet pulse cleaning to continuously regenerate the filter cartridges. Heavy contaminants are pre-separated and collected in a dust tray before reaching the filter media, preventing overload and ensuring constant airflow performance over long operating periods.
The HEM-70 achieves 99.9% filtration efficiency for particles in the 0.2–2 μm range. The AFC filter unit uses sub-micron filtration media (dust class M), ensuring minimal particle escape and preventing recontamination of the substrate.
Opportunities to improve print quality and production efficiency
By re-evaluating how contamination control is integrated into your narrow web production line, you can significantly improve cleaning efficiency and process stability by using targeted non-contact cleaning.
Contact us to review your production challenges and explore how non-contact cleaning can support your existing quality strategy.
Prefer to review the technical specifications first? The HEM-70 brochure is available on request.
